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Proceedings Paper

Photoresist materials: a historical perspective
Author(s): C. Grant Willson; Ralph R. Dammel; Arnost Reiser
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Paper Abstract

This paper provides a short history of the development of resist materials. We trace the development of resists form the very beginnings of photography in the early 1800's to today's efforts to develop 193nm resist materials.

Paper Details

Date Published: 7 July 1997
PDF: 14 pages
Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275921
Show Author Affiliations
C. Grant Willson, Univ. of Texas/Austin (United States)
Ralph R. Dammel, Hoechst Celanese Corp. (United States)
Arnost Reiser, Polytechnic Univ. (United States)


Published in SPIE Proceedings Vol. 3050:
Metrology, Inspection, and Process Control for Microlithography XI
Susan K. Jones, Editor(s)

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