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Proceedings Paper

High-precision calibration of a scanning probe microscope (SPM) for pitch and overlay measurements
Author(s): Donald A. Chernoff; Jason D. Lohr; Douglas P. Hansen; Michael Lines
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Paper Abstract

A general purpose SPM can function as a metrology SPM when used with a new type of calibration standard and new data analysis software. The calibration standard is a 288-nm pitch, 1D holographic grating. The holographic exposure process assures uniform feature spacing over the entire specimen area, with an expected accuracy of 0.1 percent. We developed new software for data analysis and used it to diagnose and correct the residual scan nonlinearity of a standard NanoScope SPM. We improved the differential non- linearity of a 10 micron scan from 6.7 percent to 1.1 percent and we improved the integral non-linearity from 0.5 percent to 0.04 percent. We then applied the improved instrument to gauge feature spacing son magnetic disks, integrated circuits, and optical disks.

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275913
Show Author Affiliations
Donald A. Chernoff, Advanced Surface Microscopy, Inc. (United States)
Jason D. Lohr, Advanced Surface Microscopy, Inc. (United States)
Douglas P. Hansen, MOXTEK, Inc. (United States)
Michael Lines, MOXTEK, Inc. (United States)


Published in SPIE Proceedings Vol. 3050:
Metrology, Inspection, and Process Control for Microlithography XI
Susan K. Jones, Editor(s)

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