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Proceedings Paper

Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist
Author(s): Seong-Ju Kim; Joo Hyeon Park; Ji-Hong Kim; Ki-Dae Kim; Hosull Lee; Jae Chang Jung; Cheol-Kyu Bok; Ki-Ho Baik
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Paper Abstract

A number of single layer ArF resist systems based on acrylic polymer have been reported. However, the resist systems generally have poor dry etch durability and unusual developing condition. To overcome these problems, in this work, we have developed a novel alkaline soluble polymer through deprotection. The polymer was prepared by free radical polymerization of maleic anhydride, norbornene, and t-butyl 3- bicyclo-(2,2,1)-hept-5-en-2-yl 3-hydroxypropionate. Since our polymer system contains large amount of alicyclic carbon and hydroxy group in the polymer chain, the system shows good adhesion, thermal stability, and high transmittance at 193 nm. The resist based on the polymer shows positive tone image of 0.17 micrometer L/S in the presence of photoacid generators such as onium salts. We describe this resist system together with the synthese of monomer and polymer, their characterizations and some of results of lithographic performance.

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275898
Show Author Affiliations
Seong-Ju Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Joo Hyeon Park, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Ji-Hong Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Ki-Dae Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Hosull Lee, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Jae Chang Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Cheol-Kyu Bok, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Ho Baik, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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