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Proceedings Paper

Use of complex coordination chemistry for the deposition of inorganic materials: spin on metals and photoresist-free lithography
Author(s): Sharon L. Blair; C. Winnie Chu; Ralph R. Dammel; Ross H. Hill
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Paper Abstract

The chemistry of coordination complexes in the solid state has been investigated with a view towards developing new methods and processes for the deposition of materials. The processes investigated include the development of spin on metals and photolithographic deposition methods. In the spin on metal process a film of an appropriate complex is spin cast and thermalized to deposit the requisite metal. For photolithographic deposition a precursor film is deposited. Ultraviolet exposure of the films through an optical/UV lithography mask results in the patterning of materials in the exposed regions. The development of this method requires photochemically active complexes which efficiently eject ligands upon photolysis to produce the desired material in a solid state thin film. A generic reaction for the production of metal films is illustrated in equation 1. MLn(thin film) (Delta )hvyields M(thin film)+ n L(g). In this paper the thermal, photo and electron beam induced chemistry of thin films of inorganic complexes of lead and chromium is presented.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275884
Show Author Affiliations
Sharon L. Blair, Simon Fraser Univ. (Canada)
C. Winnie Chu, Simon Fraser Univ. (Canada)
Ralph R. Dammel, Hoechst Celanese Corp. (United States)
Ross H. Hill, Simon Fraser University (Canada)


Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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