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Proceedings Paper

Novel combination of photoactive species: photoresists formed from selectively esterified novolacs and polyfunctional photoactive compounds
Author(s): Alfred T. Jeffries; David J. Brzozowy; Ahmad A. Naiini; Paula M. Gallagher-Wetmore
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Paper Abstract

The addition of selected PACs to resists comprised of selectively esterified DNQ novolacs improves their performance in terms of side wall angle and resolution compared to resists whose photoactive component is composed of entirely selectively esterified DNQ novolacs. The performance gain is particularly evident for the resists with two selectively esterified fractions. A conventional 60/40 m-cresol/p-cresol novolac was synthesized and fractionated into five nearly equal weight fractions using supercritical fluids (SCF) fractionation technique. Resists were made from either a single esterified fraction [fraction Two, esterification level (EL), 42%] or dual esterified fractions (fractions Two and Four, EL 21% each), a selection of PACs and the remaining unesterified fractions. They were compared to a control containing only the corresponding esterified fraction(s). The PACs A and B were effective at increasing the resist profile angle for 0.50 (mu) features in the singly esterified novalacs in comparison to the control material and exhibited flat tops. The resolution and profiles of dual esterified fraction resists improved significantly when low levels of PACs were added to dual esterified fraction control resist. The comparison was made from 0.40 (mu) features. The resist made using PAC C is the best candidate for photospeed although its profile angle is less in comparison to PACs A and B.

Paper Details

Date Published: 7 July 1997
PDF: 11 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275876
Show Author Affiliations
Alfred T. Jeffries, Olin Microelectronic Materials (United States)
David J. Brzozowy, Olin Microelectronic Materials (United States)
Ahmad A. Naiini, Olin Microelectronic Materials (United States)
Paula M. Gallagher-Wetmore, Phasex Corp. (United States)


Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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