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Proceedings Paper

Vacuum-vapor-deposited films based on benzo(a)phenoxazine derivatives under surface plasma fluorination
Author(s): Vladimir Enokovich Agabekov; Olga Evgenyevna Ignasheva; Vladimir N. Belyatsky
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Paper Abstract

Modification of vacuum vapor deposited thin films based on benzo(a)phenoxazone-5 derivatives with C3F8 and SF6 plasma were investigated. X-ray photoelectron spectroscopy (XPS) method was used to identify and study the distribution of surface functional groups of untreated and fluorinated films investigated. It was shown that fluor content in element composition of surface film layers and perfluorocarbon group content in Cls-lines of XP-spectra depended on chemical structure of the initial compounds. The more quantity and size of side substitutes were contained in the compound chemical structure the less was the content of fluor and perfluorocarbon groups in film surface fluorinated layer. The probable way of plasma active particle interaction with film surface is discussed. Using Kaelbe's method the influence of treatment conditions and initial compound chemical structure on surface properties of fluorinated films was studied.

Paper Details

Date Published: 7 July 1997
PDF: 8 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275875
Show Author Affiliations
Vladimir Enokovich Agabekov, Institute of Physical-Organic Chemistry (Belarus)
Olga Evgenyevna Ignasheva, Institute of Physical-Organic Chemistry (Belarus)
Vladimir N. Belyatsky, Institute of Physical-Organic Chemistry (Belarus)

Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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