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Proceedings Paper

Structure and property relationships of fractionated novolac resins
Author(s): K. Rex Chen; Ranee W. Kwong; George M. Jordhamo; Robert D. Allen; Paula M. Gallagher-Wetmore
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Paper Abstract

In a previous paper, we described the performance of near- monodisperse novolak resins obtained through supercritical fluid extraction. The low molecular weight partner was found to be the key element for high contrast and high resolution of the reconstructed tandem resists. In this paper, we use 13C NMR spectroscopy to further explore the microstructure and the composition of each fraction. The results show that the percentage of ortho-ortho methylene bond (%o-o') remains relatively constant throughout all the fractions. However, the %o-o' unhindered CH2-bond is higher for the low molecular weight fraction than for that of the high molecular weight fraction. Also, the p-cresol to m-cresol ratio (p/m) is not constant among all the fractions. The p/m ratio of the lower MW fraction is greater than 2, then quickly reduces to 1 and then gradually decreases to 0.6. Since the %o-o' unhindered CH2- linkage is mainly the bond between p-cresol unit, it is expected to see that as the p/m ratio increases, the %o-o' unhindered bond increases. The good lithographic performance of some of the tandem resist described previously is closely related to this high ortho-ortho linkage. However, as the amount of low MW partner increases without corresponding adjustment of PAC loading, microgrooving is observed. We discuss the effect of PAC loading on the lithographic performance in these low molecular rich formulations.

Paper Details

Date Published: 7 July 1997
PDF: 12 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275862
Show Author Affiliations
K. Rex Chen, IBM Microelectronics Div. (United States)
Ranee W. Kwong, IBM Microelectronics Div. (United States)
George M. Jordhamo, IBM Microelectronics Div. (United States)
Robert D. Allen, IBM Almaden Research Ctr. (United States)
Paula M. Gallagher-Wetmore, Phasex Corp. (United States)


Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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