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Proceedings Paper

Overview of photoacid generator design for acetal resist systems
Author(s): Francis M. Houlihan; Omkaram Nalamasu; Elsa Reichmanis; Allen G. Timko; Ulrike Varlemann; Thomas I. Wallow; N. R. Bantu; John J. Biafore; Thomas R. Sarubbi; Pasquale A. Falcigno; H. J. Kirner; Norbert Muenzel; Klaus Petschel; Hans-Thomas Schacht; Reinhard Schulz
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Paper Abstract

An overview is given of how the design of photoacid generators (PAGs) is critical to tuning both the lithographic and thermal properties of chemically amplified resist systems. The importance of PAG chemistry is illustrated with an ARCH resist system that contains acetal protecting groups removable with low activation energies. We detail the effect of PAG on the resist's resolution, depth of focus and thermal decomposition temperature.

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275848
Show Author Affiliations
Francis M. Houlihan, Lucent Technologies Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies Bell Labs. (United States)
Elsa Reichmanis, Lucent Technologies Bell Labs. (United States)
Allen G. Timko, Lucent Technologies Bell Labs. (United States)
Ulrike Varlemann, Lucent Technologies Bell Labs. (United States)
Thomas I. Wallow, Lucent Technologies Bell Labs. (United States)
N. R. Bantu, Olin Microelectronic Materials (United States)
John J. Biafore, Olin Microelectronic Materials (United States)
Thomas R. Sarubbi, Olin Microelectronic Materials (United States)
Pasquale A. Falcigno, Ciba Specialty Chemicals, Inc. (Switzerland)
H. J. Kirner, Ciba Specialty Chemicals, Inc. (Switzerland)
Norbert Muenzel, Ciba Specialty Chemicals, Inc. (Switzerland)
Klaus Petschel, Ciba Specialty Chemicals, Inc. (Switzerland)
Hans-Thomas Schacht, Ciba Specialty Chemicals, Inc. (Switzerland)
Reinhard Schulz, Ciba Specialty Chemicals, Inc. (Switzerland)


Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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