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Proceedings Paper

Design and process of a new DUV ARCH3 resist
Author(s): N. R. Bantu; Brian Maxwell; Arturo N. Medina; Thomas R. Sarubbi; Medhat A. Toukhy; Hans-Thomas Schacht; Pasquale A. Falcigno; Norbert Muenzel; Klaus Petschel; Francis M. Houlihan; Omkaram Nalamasu; Allen G. Timko
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Paper Abstract

A new concept for polymer design is described which can extend the utility of acetal chemistry in the development of advanced chemically amplified deep-UV resists for KrF excimer lasers. Many acetal blocked polymers only impart marginal thermal flow properties to the photoresist matrix. This polymer design concept can overcome this thermal flow deficiency and also improve photoresist contrast and resolution. This concept involves the formation of crosslinked acetal polymers from linear acetal blocked polymers via acid labile crosslinks. The resulting branched polymers have increased Tg and therefore impart improved thermal flow properties to the resist. Furthermore, the acid lability of the crosslinks results in a large molecular weight differential between exposed and unexposed areas of the resist leading to larger dissolution rate discrimination between exposed and unexposed regions. The ultimate result is improved resolution capability of the resist system. This design concept has been incorporated into the ARCH3 resist series.

Paper Details

Date Published: 7 July 1997
PDF: 14 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275833
Show Author Affiliations
N. R. Bantu, Olin Microelectronic Materials (United States)
Brian Maxwell, Olin Microelectronic Materials (United States)
Arturo N. Medina, Olin Microelectronic Materials (United States)
Thomas R. Sarubbi, Olin Microelectronic Materials (United States)
Medhat A. Toukhy, Olin Microelectronic Materials (United States)
Hans-Thomas Schacht, Ciba Specialty Chemicals, Inc. (Switzerland)
Pasquale A. Falcigno, Ciba Specialty Chemicals, Inc. (Switzerland)
Norbert Muenzel, Ciba Specialty Chemicals, Inc. (Switzerland)
Klaus Petschel, Ciba Specialty Chemicals, Inc. (Switzerland)
Francis M. Houlihan, Lucent Technologies Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies Bell Labs. (United States)
Allen G. Timko, Lucent Technologies Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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