Share Email Print
cover

Proceedings Paper

Photoresist materials: a historical perspective
Author(s): C. Grant Willson; Ralph R. Dammel; Arnost Reiser
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials.

Paper Details

Date Published: 7 July 1997
PDF: 14 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275826
Show Author Affiliations
C. Grant Willson, Univ. of Texas at Austin (United States)
Ralph R. Dammel, Hoechst Celanese Corp. (United States)
Arnost Reiser, Polytechnic Univ. of New York (United States)


Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

© SPIE. Terms of Use
Back to Top