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Proceedings Paper

Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist: KRS
Author(s): Karen E. Petrillo; James Brancaccio; Wu-Song Huang; Ranee W. Kwong; Ahmad D. Katnani
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Paper Abstract

Accurate stepper setup is essential for getting good overlay performance on product wafers. As part of a typical stepper setup procedure, one or more wafers are exposed, developed, aligned to the initial exposure, and then exposed again in order to determine the x/y baseline position and grid rotation. By removing the wafer from the chuck for processing (baking and development) before the alignment and exposure, both pre-aligner and stage errors are introduced. If the alignment and second exposure could be made without removing the wafer from the stepper chuck, these two sources of error could be eliminated. This is possible if the resist has a strong and immediate latent image after exposure.

Paper Details

Date Published: 7 July 1997
PDF: 10 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275794
Show Author Affiliations
Karen E. Petrillo, IBM Thomas J. Watson Research Ctr. (United States)
James Brancaccio, IBM Thomas J. Watson Research Ctr. (United States)
Wu-Song Huang, IBM Microelectronics Div. (United States)
Ranee W. Kwong, IBM Microelectronics Div. (United States)
Ahmad D. Katnani, IBM Microelectronics Div. (United States)


Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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