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Proceedings Paper

Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry
Author(s): Kenneth A. Goldberg; Edita Tejnil; Sang Hun Lee; Hector Medecki; David T. Attwood; Keith H. Jackson; Jeffrey Bokor
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Paper Abstract

We report wavefront measurement of a multilayer-coated, reflective optical system at 13.4-nm wavelength performed using a novel phase-shifting point-diffraction interferometer. Successful interferometric measurements of a 10x Schwarzschild objective designed for extreme ultraviolet projection lithography with 0.1-micrometer resolution demonstrate high- precision with sub-nanometer resolution. The goal of the interferometry is to achieve wavefront measurement accuracy beyond lambda/50 rms at EUV wavelengths. Preliminary measurements are discussed and the paths toward achieving the target accuracy are identified.

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275787
Show Author Affiliations
Kenneth A. Goldberg, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Edita Tejnil, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Sang Hun Lee, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Hector Medecki, Lawrence Berkeley National Lab. (United States)
David T. Attwood, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Keith H. Jackson, Lawrence Berkeley National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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