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Proceedings Paper

SCALPEL proof-of-concept system: preliminary lithography results
Author(s): Warren K. Waskiewicz; Christopher J. Biddick; Myrtle I. Blakey; Kevin J. Brady; Ron M. Camarda; Wayne F. Connelly; A. H. Crorken; J. P. Custy; R. DeMarco; Reginald C. Farrow; Joseph A. Felker; Linus A. Fetter; Richard R. Freeman; Lloyd R. Harriott; Leslie C. Hopkins; Harold A. Huggins; Richard J. Kasica; Chester S. Knurek; Joseph S. Kraus; James Alexander Liddle; Masis M. Mkrtchyan; Anthony E. Novembre; Milton L. Peabody; Len Rutberg; Harry H. Wade; Pat G. Watson; Kurt S. Werder; David L. Windt; Regine G. Tarascon-Auriol; Steven D. Berger; Stephen W. Bowler
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Paper Abstract

We have designed, constructed, and are now performing experiments with a proof-of-concept projection electron-beam lithography system based upon the SCALPELR (scattering with angular limitation projection electron-beam lithography) principle. This initial design has enabled us to demonstrate the feasibility of not only the electron optics, but also the scattering mask and resist platform. In this paper we report on some preliminary results which indicate the lithographic potential and benefits of this technology for the production of sub-0.18 micrometer features.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275786
Show Author Affiliations
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)
Christopher J. Biddick, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Kevin J. Brady, Lucent Technologies/Bell Labs. (United States)
Ron M. Camarda, Lucent Technologies/Bell Labs. (United States)
Wayne F. Connelly, Lucent Technologies/Bell Labs. (United States)
A. H. Crorken, Lucent Technologies/Bell Labs. (United States)
J. P. Custy, Lucent Technologies/Bell Labs. (United States)
R. DeMarco, Lucent Technologies/Bell Labs. (United States)
Reginald C. Farrow, Lucent Technologies/Bell Labs. (United States)
Joseph A. Felker, Lucent Technologies/Bell Labs. (United States)
Linus A. Fetter, Lucent Technologies/Bell Labs. (United States)
Richard R. Freeman, Lucent Technologies/Bell Labs. (United States)
Lloyd R. Harriott, Lucent Technologies/Bell Labs. (United States)
Leslie C. Hopkins, Lucent Technologies/Bell Labs. (United States)
Harold A. Huggins, Lucent Technologies/Bell Labs. (United States)
Richard J. Kasica, Lucent Technologies/Bell Labs. (United States)
Chester S. Knurek, Lucent Technologies/Bell Labs. (United States)
Joseph S. Kraus, Lucent Technologies/Bell Labs. (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Masis M. Mkrtchyan, Lucent Technologies/Bell Labs. (United States)
Anthony E. Novembre, Lucent Technologies/Bell Labs. (United States)
Milton L. Peabody, Lucent Technologies/Bell Labs. (United States)
Len Rutberg, Lucent Technologies/Bell Labs. (United States)
Harry H. Wade, Lucent Technologies/Bell Labs. (United States)
Pat G. Watson, Lucent Technologies/Bell Labs. (United States)
Kurt S. Werder, Lucent Technologies/Bell Labs. (United States)
David L. Windt, Lucent Technologies/Bell Labs. (United States)
Regine G. Tarascon-Auriol, DuPont Photomasks (France)
Steven D. Berger, Integrated Solutions Inc. (United States)
Stephen W. Bowler, Integrated Solutions Inc. (United States)


Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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