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Proceedings Paper

Interferometric lithography exposure tool for 180-nm structures
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Paper Abstract

Keywords: interferometric lithography, 300-mm wafer, 1 80-nm CD

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275785
Show Author Affiliations
Saleem H. Zaidi, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)
Franklin M. Schellenberg, SEMATECH and KLA (United States)
R. Scott Mackay, SEMATECH (United States)
K. Uekert, Interserv Corp. (United States)
Jeffrey J. Persoff, Interserv Corp. (United States)

Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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