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Proceedings Paper

Active noise cancellation technique for highly accurate EB lithography systems
Author(s): Koji Nagata; Masahide Okumura; Norio Saitou; Hiroyoshi Ando; Toshiyuki Morimura; Ken Iizumi; Teruo Iwasaki
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Paper Abstract

We propose a compensation method, which we call the active noise cancelation technique, to improve the pattern positioning accuracy in electron-beam (EB) lithography. This compensation method corrects pattern positioning error by eliminating EB vibration at the power-supply (PS) frequency (50 or 60 Hz), which is one of the main causes of the error. In this compensation method, a compensatory signal is generated by extracting one period from the EB vibration, which is measured before exposure. During exposure, this signal is added to the deflection-control signal. Because the EB is constantly deflected in the direction opposite to the EB vibration, the pattern positioning error due to EB vibration can be corrected. To evaluate the improvement of the accuracy of an EB lithography system with this compensation method, we applied it to our EB lithography system (HL-800 series). We found that the EB vibration at the PS frequency, whose amplitude was about 0.03 micrometer without the use of this compensation method could be reduced to less than 0.01 micrometer with the compensation. We also evaluated the stitching accuracy between stripes of continues stage moving. Without compensation, the accuracy (mean plus 3 sigma) was improved from 0.064 micrometer in the X direction and 0.044 micrometer in the Y direction to 0.027 and 0.014 micrometer respectively by using this compensation. Therefore, we confirmed that this compensation method was effective to improve the accuracy of EB lithography systems.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275778
Show Author Affiliations
Koji Nagata, Hitachi, Ltd. (Japan)
Masahide Okumura, Hitachi, Ltd. (Japan)
Norio Saitou, Hitachi, Ltd. (Japan)
Hiroyoshi Ando, Hitachi, Ltd. (Japan)
Toshiyuki Morimura, Hitachi, Ltd. (Japan)
Ken Iizumi, Hitachi, Ltd. (Japan)
Teruo Iwasaki, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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