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Proceedings Paper

Metrology and quantification of micromilled x-ray masks and exposures
Author(s): Craig Friedrich; Philip Coane; Joe Goettert; Niranjan Gopinathin
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Paper Abstract

Micromechanical milling has been shown to be a rapid and direct method for the production of x-ray masks with features within the process limits. A method for compensating milling tool run out has been adapted and the tolerance of mask absorber features has been reduced to approximately 0.5 micrometers. The milling process leaves some absorber burrs and the absorber is also tapered at the machined wall which introduces an additional process bias, both of which add to exposure degradation. Nevertheless, both of these effects can be greatly reduced with further work.

Paper Details

Date Published: 7 July 1997
PDF: 5 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275776
Show Author Affiliations
Craig Friedrich, Michigan Technological University (MEEM) (United States)
Philip Coane, Louisiana Tech University (United States)
Joe Goettert, Louisiana Tech University (United States)
Niranjan Gopinathin, Louisiana Tech University (United States)


Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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