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Proceedings Paper

Sloped irradiation techniques in deep x-ray lithography for 3D shaping of microstructures
Author(s): Gregor Feiertag; Wolfgang Ehrfeld; Heinz Lehr; Martin Schmidt
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Paper Abstract

Deep x-ray lithography (DXRL) makes use of synchrotron radiation (SR) to transfer an absorber pattern from a mask into a thick resist layer. For most applications the direction of the SR beam is perpendicular to the mask and the resist plane. Subsequent replication techniques, e.g. electroforming, moulding or hot embossing, convert the resist relief obtained after development into micromechanical, microfluidic or micro- optical elements made from metals, polymers or ceramic materials. This process sequence is well known as the LIGA technique. The normal shadow printing process is complemented and enhanced by advanced techniques, e.g. by tilting the mask and the resist with respect to the SR beam or aligned multiple exposures to produce step-like structures. In this paper a technology for the fabrication of multidirectional inclined microstructures applying multiple tilted DXRL will be presented. Instead of one exposure with the mask/substrate assembly perpendicular to the SR beam, irradiation is performed several times applying tilt and rotational angles of the mask/substrate assembly relative to the SR beam. A huge variety of 3-D structures can be obtained using this technique. Some possible applications will be discussed.

Paper Details

Date Published: 7 July 1997
PDF: 10 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275770
Show Author Affiliations
Gregor Feiertag, Institute of Microtechnology Mainz GmbH (Germany)
Wolfgang Ehrfeld, Institute of Microtechnology Mainz GmbH (Germany)
Heinz Lehr, Institute of Microtechnology Mainz GmbH (Germany)
Martin Schmidt, Institute of Microtechnology Mainz GmbH (Germany)


Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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