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Proceedings Paper

Photoacoustic characterization of surface absorption
Author(s): David W. Reicher; Scott R. Wilson; C. F. Kranenberg; M. Yasin Akhtar Raja; John Robert McNeil; Steven R. J. Brueck
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Paper Abstract

Photoacoustic spectrososcopy is used to characterize the surface absorption of polished fused silica substrates and thin films deposited on fused silica substrates. The extreme sensitivity of this technique allows measurement of surface absorptions of a few tenths of a part per million. Characterization of samples with surfaces finished using a variety of methods is reported. Key words: Photoacoustic ion beam absorption thin films. 1.

Paper Details

Date Published: 1 June 1991
PDF: 7 pages
Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.27534
Show Author Affiliations
David W. Reicher, Univ. of New Mexico (United States)
Scott R. Wilson, Univ. of New Mexico (United States)
C. F. Kranenberg, Univ. of New Mexico (United States)
M. Yasin Akhtar Raja, Univ. of New Mexico (United States)
John Robert McNeil, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 1441:
Laser-Induced Damage in Optical Materials: 1990
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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