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Proceedings Paper

New fabrication method for diffractive optical elements with deep phase relief
Author(s): Victor Pavlovich Korolkov; Voldemar Petrovich Koronkevich; Anatoly I. Malyshev; Vladislav G. Nikitin
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Paper Abstract

The application of continuous-tone photomasks for fabrication of diffractive optical elements with a deep phase relief is explored. Results of computer simulation for technological process are reported and compared with experiment. The experimental testing of offered technique was carried out on thick AZ4562 photoresist layers. The possibility of deep phase relief fabrication has been proven. The application of the new technique to fabrication of multiorder diffractive elements is discussed.

Paper Details

Date Published: 15 May 1997
PDF: 12 pages
Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); doi: 10.1117/12.274416
Show Author Affiliations
Victor Pavlovich Korolkov, Institute of Automation and Electrometry (Russia)
Voldemar Petrovich Koronkevich, Institute of Automation and Electrometry (Russia)
Anatoly I. Malyshev, Institute of Automation and Electrometry (Russia)
Vladislav G. Nikitin, Novosibirsk State Univ. (Russia)


Published in SPIE Proceedings Vol. 3010:
Diffractive and Holographic Device Technologies and Applications IV
Ivan Cindrich; Sing H. Lee, Editor(s)

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