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Proceedings Paper

Processing parameter optimization for thermochemical writing of DOEs on chromium films
Author(s): Vadim V. Cherkashin; Evgeny G. Churin; Victor Pavlovich Korolkov; Voldemar Petrovich Koronkevich; Andrey A. Kharissov; Alexander G. Poleshchuk; James H. Burge
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Paper Abstract

Computer-generated holograms are limited by conventional lithographic fabrication capabilities which rely on accurate deposition, exposure, and developing of photosensitive chemicals. We present an alternate fabrication technology that uses a focused laser beam to write patterns by inducing a thermochemical change in a bare metal film. The patterns are developed using a single etching step that dissolves the non- exposed metal. The thermochemical writing method allows holograms to be directly written onto large-diameter, thick, and non-flat substrates, requiring no intermediate steps that compromise the ultimate accuracy. Circular patterns for optical testing were written using a polar-coordinate laser writer. The laser power and control requirements are shown to be modest and the etching is shown to be tolerant of temperature and concentration variations. The technology is demonstrated with the fabrication of CGHs up to 136 mm in diameter used for optical testing.

Paper Details

Date Published: 15 May 1997
PDF: 12 pages
Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); doi: 10.1117/12.274415
Show Author Affiliations
Vadim V. Cherkashin, Institute of Automation and Electrometry (Russia)
Evgeny G. Churin, Institute of Automation and Electrometry (Russia)
Victor Pavlovich Korolkov, Institute of Automation and Electrometry (Russia)
Voldemar Petrovich Koronkevich, Institute of Automation and Electrometry (Russia)
Andrey A. Kharissov, Institute of Automation and Electrometry (Russia)
Alexander G. Poleshchuk, Institute of Automation and Electrometry (Russia)
James H. Burge, Steward Observatory/Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 3010:
Diffractive and Holographic Device Technologies and Applications IV
Ivan Cindrich; Sing H. Lee, Editor(s)

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