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Proceedings Paper

Potential of e-beam writing for diffractive optics
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Paper Abstract

E-beam lithography (EBL) is a powerful tool in optics. Optician can use the progress in EBL to fabricate optical components and systems with novel functions. However, EBL is dominated by microelectronics. Therefore the demands of optics are not always met by the exiting EBL technology. Some possibilities as well as limits of EBL in optics are discussed at the example of diffractive optics.

Paper Details

Date Published: 15 May 1997
PDF: 6 pages
Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); doi: 10.1117/12.274413
Show Author Affiliations
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Frank Wyrowski, Friedrich-Schiller-Univ. Jena (Germany)

Published in SPIE Proceedings Vol. 3010:
Diffractive and Holographic Device Technologies and Applications IV
Ivan Cindrich; Sing H. Lee, Editor(s)

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