Share Email Print

Proceedings Paper

CO-OP DOE foundry process results
Author(s): Thomas R. Werner; J. Allen Cox; J. Gieske; K. Hewitt; Kannan Raj; Ravindra A. Athale
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The DARPA-funded Consortium for Optical and Optoelectronic Technologies for Computing (CO-OP) recently completed the first DOE Foundry run delivering ten samples to each of nineteen users, each with a unique design. The binary optics process was used to provide a maximum of eight phase levels at a design wavelength of 850 nm. Averaged over all users and all samples, an etch depth error of one percent and alignment accuracy within 0.25 micron were achieved. This paper summarizes the details of the process results.

Paper Details

Date Published: 15 May 1997
PDF: 9 pages
Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); doi: 10.1117/12.274405
Show Author Affiliations
Thomas R. Werner, Honeywell Inc. (United States)
J. Allen Cox, Honeywell Inc. (United States)
J. Gieske, Honeywell Inc. (United States)
K. Hewitt, Honeywell Inc. (United States)
Kannan Raj, George Mason Univ. (United States)
Ravindra A. Athale, George Mason Univ. (United States)

Published in SPIE Proceedings Vol. 3010:
Diffractive and Holographic Device Technologies and Applications IV
Ivan Cindrich; Sing H. Lee, Editor(s)

© SPIE. Terms of Use
Back to Top