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Proceedings Paper

Influence of substrate cleaning on LIDT of 355 nm HR coatings
Author(s): Jean DiJon; Pierre Garrec; Norbert Kaiser; Uwe B. Schallenberg
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Paper Abstract

An advanced high-purity reactive e-beam evaporation process was used to deposit Al2O3/SiO2 HR coatings for 355 nm high-power laser applications. Both 1:1 and R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal and non-normal incident design were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm2. Post-cleaning of coated substrates degrades LIDT.

Paper Details

Date Published: 13 May 1997
PDF: 9 pages
Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274290
Show Author Affiliations
Jean DiJon, LETI/CEA (France)
Pierre Garrec, LETI/CEA (France)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Uwe B. Schallenberg, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 2966:
Laser-Induced Damage in Optical Materials: 1996
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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