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Proceedings Paper

Optical properties of thin films deposited by reactive-Rf-magnetron sputtering
Author(s): Kunio Yoshida; Tomosumi Kamimura; Kanyoshi Ochi; Schukichi Kaku; Hidetsugu Yoshida; Hisanori Fujita; F. Tani; M. Sunagawa; Takayuki Okamoto
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Paper Abstract

Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate, and the change of spectral characteristics and film stress in the relative humidity. Thin films coated by reactive-rf-magnetron sputtering improve these problems. In this paper, optical properties of thin films deposited by reactive-rf-magnetron sputtering are presented.

Paper Details

Date Published: 13 May 1997
PDF: 1 pages
Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274285
Show Author Affiliations
Kunio Yoshida, Osaka Institute of Technology (Japan)
Tomosumi Kamimura, Osaka Institute of Technology (Japan)
Kanyoshi Ochi, Osaka Institute of Technology (Japan)
Schukichi Kaku, Osaka Institute of Technology (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)
Hisanori Fujita, Osaka Univ. (Japan)
F. Tani, Shinmaywa Industry Co., Ltd. (Japan)
M. Sunagawa, Shinmaywa Industry Co., Ltd. (Japan)
Takayuki Okamoto, Okamoto Optics Co. (Japan)


Published in SPIE Proceedings Vol. 2966:
Laser-Induced Damage in Optical Materials: 1996
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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