Share Email Print
cover

Proceedings Paper

Stress and environmental shift characteristics of HfO2/SiO2 multilayer coatings
Author(s): J. F. Anzellotti; Douglas J. Smith; Robert J. Sczupak; Z. Roman Chrzan
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

HfO2/SiO2 polarizer coatings for 1054 nm have been produced that have low stress at explicit environmental conditions without the employment of backside stress- compensation films. In this process hafnia is condensed from a metallic melt and silica from an oxide source, both via electron-beam evaporation. Specifically, this process has been adopted for multilayer designs with stringent requirements on spectral control and wavefront distortion. Efforts to meet these requirements have prompted various investigations of coating stress and spectral behavior, especially under changing environmental conditions. Results have shown that coating stress and optical thickness vary significantly with humidity. THese quantities have been measured under both ambient air and dry nitrogen atmospheres. The effects of coating parameters on stress and environmental stability have been examined for an experimental hafnia/silica polarizer coating. The aforementioned parameters are hafnia deposition rate, oxygen pressure during hafnia deposition, and oxygen pressure during silica deposition. Results indicate a strong correlation of coating stress to oxygen pressure during the silica evaporation. Data on the aging of stress in hafnia/silica coatings will also be presented. The HfO2/SiO2 process has ben utilized in high-laser-damage- threshold coatings for the OMEGA laser system and for National Ignition Facility development coatings at the Laboratory for Laser Energetics.

Paper Details

Date Published: 13 May 1997
PDF: 7 pages
Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274221
Show Author Affiliations
J. F. Anzellotti, Univ. of Rochester (United States)
Douglas J. Smith, Univ. of Rochester (United States)
Robert J. Sczupak, Barr Associates, Inc. (United States)
Z. Roman Chrzan, Univ. of Rochester (United States)


Published in SPIE Proceedings Vol. 2966:
Laser-Induced Damage in Optical Materials: 1996
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

© SPIE. Terms of Use
Back to Top