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Proceedings Paper

WDM laser arrays with 2-nm channel spacing fabricated using a grating phase mask
Author(s): David Robert McDonald; Jin Hong; Frank R. Shepherd; Carla J. Miner; M. Cleroux; S. Ojha; R. Baulcomb; C. Rogers; S. J. Clements
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Paper Abstract

High density wavelength division multiplexing (DWDM) requires several channels with a fixed wavelength spacing of 1 - 2 nm. This can be achieved by fabricating arrays of distributed feedback (DFB) lasers, using a photomask method to print the gratings with a different period for each DFB laser in the array. The grating phase mask is fabricated first, using e-beam lithography and reactive ion etching. The parallel exposure of all gratings using such a mask is orders of magnitude faster than direct wafer writing, using e-beam lithography. The characteristics of 8-channel gain coupled DFB laser arrays designed for a 2 nm channel spacing are reported. The required performance, achievable yield (i.e. cost), packaging requirements and reliability will determine whether these arrays are suitable for use in DWDM systems.

Paper Details

Date Published: 1 May 1997
PDF: 8 pages
Proc. SPIE 3004, Fabrication, Testing, and Reliability of Semiconductor Lasers II, (1 May 1997); doi: 10.1117/12.273819
Show Author Affiliations
David Robert McDonald, Nortel Technology (Canada)
Jin Hong, Nortel Technology (Canada)
Frank R. Shepherd, Nortel Technology (Canada)
Carla J. Miner, Nortel Technology (Canada)
M. Cleroux, Nortel Technology (Canada)
S. Ojha, Nortel Technology (United Kingdom)
R. Baulcomb, Nortel Technology (United Kingdom)
C. Rogers, Nortel Technology (United Kingdom)
S. J. Clements, Nortel Technology (United Kingdom)


Published in SPIE Proceedings Vol. 3004:
Fabrication, Testing, and Reliability of Semiconductor Lasers II
Mahmoud Fallahi; S. C. Wang, Editor(s)

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