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Proceedings Paper

UV-laser modifications and etching of thin polymer films in different environments
Author(s): Nikita M. Bityurin; Sergey V. Muraviov; Alexander P. Alexandrov; N. G. Bronnikova; Aleksey Yu. Malyshev
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Paper Abstract

The role of environment in modification and etching of polymethylmethacrylate (PMMA) films by the fifth harmonic of Nd laser is investigated experimentally. The theoretical model is developed, which describes the main features of modification and etching kinetics for sufficiently small laser fluences.

Paper Details

Date Published: 4 April 1997
PDF: 9 pages
Proc. SPIE 3093, Nonresonant Laser-Matter Interaction (NLMI-9), (4 April 1997); doi: 10.1117/12.271664
Show Author Affiliations
Nikita M. Bityurin, Institute of Applied Physics (Russia)
Sergey V. Muraviov, Institute of Applied Physics (Russia)
Alexander P. Alexandrov, Institute of Applied Physics (Russia)
N. G. Bronnikova, Institute of Applied Physics (Russia)
Aleksey Yu. Malyshev, Institute of Applied Physics (Russia)


Published in SPIE Proceedings Vol. 3093:
Nonresonant Laser-Matter Interaction (NLMI-9)
Vitali I. Konov; Mikhail N. Libenson, Editor(s)

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