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Proceedings Paper

Compact ArF excimer lasers specific to microlithography and surgery
Author(s): Hitoshi Sekita; Jun-ichi Yano; Akifumi Tada; Masashi Tamegai; Kenichi Yoshida; Tadashi Kasamatsu; Shinji Ito; Takashi Saito; Yukio Ogura
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Paper Abstract

High repetition rate operation technology and spectral narrowing technology with compact excimer lasers whose cross-sectional dimensions are around 120 by 120 mm. High repetition rate operation over 1.5 kHz and spectral narrowing to 1 pm are reported. These technologies are essential to promising applications of ArF excimer lasers. High resolution pattern of 0.16 micrometer line and space is demonstrated by an optical laser lithography with the compact ArF excimer laser. The smallest ArF excimer laser specific to the photo-chemical surgery of cornea is also presented.

Paper Details

Date Published: 4 April 1997
PDF: 8 pages
Proc. SPIE 2987, Gas and Chemical Lasers and Applications II, (4 April 1997); doi: 10.1117/12.271552
Show Author Affiliations
Hitoshi Sekita, NEC Corp. (Japan)
Jun-ichi Yano, NEC Corp. (Japan)
Akifumi Tada, NEC Corp. (Japan)
Masashi Tamegai, NEC Corp. (Japan)
Kenichi Yoshida, NEC Corp. (Japan)
Tadashi Kasamatsu, NEC Corp. (Japan)
Shinji Ito, NEC Corp. (Japan)
Takashi Saito, NEC Corp. (Japan)
Yukio Ogura, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 2987:
Gas and Chemical Lasers and Applications II
Robert C. Sze; Ernest A. Dorko, Editor(s)

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