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Proceedings Paper

Dielectric microfilter arrays for multispectral measuring devices
Author(s): Marcus Frank; Uwe B. Schallenberg; Norbert Kaiser; Wolfgang Buss
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Paper Abstract

For specified color measuring devices miniaturized dielectric filter arrays have been designed and developed. The manufacturing procedure is based on the combination of coating- and micropatterning processes including the employment of etchstop layers. The spectral properties of a basic filter, fabricated as an unpatterned filter blank, have been modified within small areas by reactive ion etching a defined number edge by edge within a period of 25 micrometers . In this paper design and development of two-color microfilter arrays are described and problems are depicted, arising with the production of multicolor dielectric microfilters. An alternative manufacturing procedure is discussed, making it possible to arrange more than two different interference filters edge by edge.

Paper Details

Date Published: 11 April 1997
PDF: 8 pages
Proc. SPIE 3008, Miniaturized Systems with Micro-Optics and Micromechanics II, (11 April 1997); doi: 10.1117/12.271423
Show Author Affiliations
Marcus Frank, Fraunhofer-Institute for Applied Optics and Precision Engineering (Germany)
Uwe B. Schallenberg, Fraunhofer-Institute for Applied Optics and Precision Engineering (Germany)
Norbert Kaiser, Fraunhofer-Institute for Applied Optics and Precision Engineering (Germany)
Wolfgang Buss, Fraunhofer-Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 3008:
Miniaturized Systems with Micro-Optics and Micromechanics II
M. Edward Motamedi; Larry J. Hornbeck; Kristofer S. J. Pister, Editor(s)

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