Share Email Print

Proceedings Paper

E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements
Author(s): Ernst-Bernhard Kley; Bernd Schnabel; Uwe D. Zeitner
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The fabrication of surface profiles for microoptical and micromechanical devices becomes more and more important. Especially the high accuracy necessary for the realization of the functional components benefits from the use of e-beam lithography, either for the fabrication of tools for optical lithography and replication techniques or for the direct writing of the pattern. After a classification of the pattern and an introduction into the processes for the realization of surface structures we show examples for the basic structure classes as well as for the integration of several properties within one profile resulting in elements with higher complexity.

Paper Details

Date Published: 11 April 1997
PDF: 11 pages
Proc. SPIE 3008, Miniaturized Systems with Micro-Optics and Micromechanics II, (11 April 1997); doi: 10.1117/12.271417
Show Author Affiliations
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Bernd Schnabel, Friedrich-Schiller-Univ. Jena (Germany)
Uwe D. Zeitner, Friedrich-Schiller-Univ. Jena (Germany)

Published in SPIE Proceedings Vol. 3008:
Miniaturized Systems with Micro-Optics and Micromechanics II
M. Edward Motamedi; Larry J. Hornbeck; Kristofer S. J. Pister, Editor(s)

© SPIE. Terms of Use
Back to Top