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Proceedings Paper

Pure aluminum process solution for advanced LCDs
Author(s): Rajiv G. Pethe; Milind Bedekar; Richard E. Demaray; Chandra V. Deshpandey; Henry Shao
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Paper Abstract

Large size high-resolution liquid crystal displays put severe restriction on metal selection for gate lines where very low resistivity is required. Pure aluminum (Al) could be used of hillocking issues could be resolved. In this paper we demonstrated an Al deposition process on glass substrates with ultra low hillock density after photoresist and dielectric processing. Effects of process parameters such as substrate temperature, substrate roughness, base pressure and underlayer thickness on morphology and texture of aluminum are discussed.

Paper Details

Date Published: 10 April 1997
PDF: 8 pages
Proc. SPIE 3014, Active Matrix Liquid Crystal Displays Technology and Applications, (10 April 1997); doi: 10.1117/12.270287
Show Author Affiliations
Rajiv G. Pethe, Applied Komatsu Technology (United States)
Milind Bedekar, Applied Komatsu Technology (United States)
Richard E. Demaray, Applied Komatsu Technology (United States)
Chandra V. Deshpandey, Applied Komatsu Technology (United States)
Henry Shao, Applied Komatsu Technology (United States)


Published in SPIE Proceedings Vol. 3014:
Active Matrix Liquid Crystal Displays Technology and Applications
Tolis Voutsas; Tsu-Jae King, Editor(s)

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