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Proceedings Paper

Recent developments of industrial excimer laser technology
Author(s): Uwe Stamm; Rainer Paetzel; Igor Bragin; Juergen Kleinschmidt; Frank Voss; Dirk Basting
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Paper Abstract

The paper reviews recent developments in high power excimer laser technology driven by industrial requirements. Technological achievements as NovaTubeTM laser tube technology and HaloSafeTM halogen generator technology are discussed. Experimental results are presented for various lasers at the most important excimer wavelengths 351 nm (XeF), 308 nm (XeCl), 248 nm (KrF), 193 nm (ArF) and 157 nm (F2) which have been designed for application in micromachining, thin-film-transistor annealing, marking as well as lithography.

Paper Details

Date Published: 4 April 1997
PDF: 8 pages
Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270114
Show Author Affiliations
Uwe Stamm, Lambda Physik GmbH (Germany)
Rainer Paetzel, Lambda Physik GmbH (Germany)
Igor Bragin, Lambda Physik GmbH (Germany)
Juergen Kleinschmidt, Lambda Physik GmbH (Germany)
Frank Voss, Lambda Physik GmbH (Germany)
Dirk Basting, Lambda Physik (Germany)


Published in SPIE Proceedings Vol. 3092:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Denis R. Hall; Howard J. Baker, Editor(s)

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