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Proceedings Paper

High-resolution microlithography using a 193 nm excimer laser source
Author(s): Nadeem Hasan Rizvi; Dominic Ashworth; Malcolm C. Gower
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Paper Abstract

A 193 nm excimer laser microstepper has been developed for deep UV photolithography research and development and system details are presented. The tool incorporates a times 10, 0.5 NA, 4 mm field diameter, high-resolution imaging lens of either all-refractive or catadioptric design. An all-fused silica refractive lens has been used in the results reported here to carry out exposures in polymethylmethacrylate (PMMA) and polyvinylphonel (MX-P8) photoresists. Well-resolved images of 0.2 micrometer dense lines and spaces have been produced in the PMMA and MX-P8 resists.

Paper Details

Date Published: 4 April 1997
PDF: 6 pages
Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270110
Show Author Affiliations
Nadeem Hasan Rizvi, Exitech Ltd. (United Kingdom)
Dominic Ashworth, Exitech Limited (United Kingdom)
Malcolm C. Gower, Exitech Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 3092:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Denis R. Hall; Howard J. Baker, Editor(s)

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