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Proceedings Paper

Performance of 1 kHz KrF excimer laser for DUV lithography
Author(s): Palash P. Das; Richard G. Morton; Igor V. Fomenkov; William N. Partlo; Richard L. Sandstrom; Cynthia A. Maley; Ray Cybulski
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Paper Abstract

In response to the requirement for higher wafer throughput and increased dosage accuracy in DUV lithography steppers and scanners, Cymer has developed a 1 kHz KrF laser optimized for this application. We shall describe its performance and design features.

Paper Details

Date Published: 4 April 1997
PDF: 4 pages
Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270109
Show Author Affiliations
Palash P. Das, Cymer, Inc. (United States)
Richard G. Morton, Maxwell Labs., Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Cynthia A. Maley, Cymer Inc. (United States)
Ray Cybulski, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 3092:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Denis R. Hall; Howard J. Baker, Editor(s)

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