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Proceedings Paper

UV and gas interactions in an enclosed 193-nm excimer laser beamline
Author(s): David J. Elliot; Jonathan C. Camp; Warren C. Harlow; Victor J. Dosoretz; Daniel Behr; Glen P. Callahan; Scott Flint
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Paper Abstract

The implementation of 193nm laser lithography for IC manufacturing is partially dependent on establishing energy efficient laser beam delivery systems of 'beamlines' in wafer steppers and other lithography and metrology tools. The objective of this work is to study the parameters that most critically impact 193nm UV energy efficiency, specifically the elimination of ozone from the beampath by providing an inert gas positive pressure ambient around the laser optics, and the use of 193nm optimized mirrors for beam delivery. An experimental 193nm laser beamline was set up with an ozone monitor and several UV detectors used throughout the optical system. 193nm-optimized laser mirrors were tested in comparison with standard laser mirrors. Three different inert gases were introduced and at various pressures while firing the laser at 50 Hz, 100 Hz, and 200 Hz reprates. Laser pulse energies are reported under these varying conditions as a function of ozone concentration. Overall laser beamline energy transmission is given as a function of laser mirror type.

Paper Details

Date Published: 31 March 1997
PDF: 13 pages
Proc. SPIE 2992, Excimer Lasers, Optics, and Applications, (31 March 1997); doi: 10.1117/12.270099
Show Author Affiliations
David J. Elliot, Excimer Laser Systems, Inc. (United States)
Jonathan C. Camp, Excimer Laser Systems, Inc. (United States)
Warren C. Harlow, Excimer Laser Systems, Inc. (United States)
Victor J. Dosoretz, InUSA (United States)
Daniel Behr, InUSA (United States)
Glen P. Callahan, Acton Research Corp. (United States)
Scott Flint, Acton Research Corp. (United States)

Published in SPIE Proceedings Vol. 2992:
Excimer Lasers, Optics, and Applications
Harry Shields; Peter E. Dyer, Editor(s)

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