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Proceedings Paper

Processing applications with the 157-nm fluorine excimer laser
Author(s): Peter R. Herman; Keith R. Beckley; Brian C. Jackson; Kou Kurosawa; David Moore; Takayuki Yamanishi; Jianhao Yang
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Paper Abstract

Excimer-laser processing techniques can be extended to a broader and more diverse range of materials by moving to vacuum-ultraviolet laser source such as the molecular fluorine laser. The 157-nm output wavelength takes advantage of the high opacity in most materials and a short pulse duration to minimize thermal loading of target surfaces. The laser readily drives photochemical interactions and affords patterning of approximately 0.1-micrometers features. In this paper, we summarize the recent progress in our laboratory on applying these principles to the development of F2 laser applications. Examples include micromachining of high- bandgap optical materials, fabricating rib waveguides, growing debris-free silica films, driving photosensitivity responses in optical fibers, photochemical processing of III-V semiconductors, and writing fine-feature holographic structures.

Paper Details

Date Published: 31 March 1997
PDF: 10 pages
Proc. SPIE 2992, Excimer Lasers, Optics, and Applications, (31 March 1997); doi: 10.1117/12.270086
Show Author Affiliations
Peter R. Herman, Univ. of Toronto (Canada)
Keith R. Beckley, Univ. of Toronto (Canada)
Brian C. Jackson, Univ. of Toronto (Canada)
Kou Kurosawa, Univ. of Miyazaki (Japan)
David Moore, Univ. of Toronto (Canada)
Takayuki Yamanishi, Univ. of Miyazaki (Japan)
Jianhao Yang, Univ. of Toronto (Canada)

Published in SPIE Proceedings Vol. 2992:
Excimer Lasers, Optics, and Applications
Harry Shields; Peter E. Dyer, Editor(s)

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