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Proceedings Paper

Improved off-axis pulsed laser deposition method
Author(s): Narumi Inoue; Tatsuya Ozaki; Toshiaki Monnaka; Shigeru Kashiwabara; Ryozo Fujimoto
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Paper Abstract

A reduction is achieved in the number of droplets and/or large particles scattered on the surface of grown film deposited by the pulsed laser deposition method. An aperture plate is placed in front of the ablation target in order to block the scattering of droplets toward the substrate. The angle dependence of the number of scattering droplets is investigated, and the optimum aperture size and substrate position are determined. Using an aperture with 5 mm- diameter hole and placing the substrate in an off-axis position result in a significant reduction of the number of droplets. The aperture is found to prevent the scattering of droplets without substantially diminishing the deposition rate of the film.

Paper Details

Date Published: 31 March 1997
PDF: 6 pages
Proc. SPIE 2992, Excimer Lasers, Optics, and Applications, (31 March 1997); doi: 10.1117/12.270083
Show Author Affiliations
Narumi Inoue, National Defense Academy (Japan)
Tatsuya Ozaki, National Defense Academy (Japan)
Toshiaki Monnaka, National Defense Academy (Japan)
Shigeru Kashiwabara, National Defense Academy (Japan)
Ryozo Fujimoto, Nippon Bunri Univ. (Japan)

Published in SPIE Proceedings Vol. 2992:
Excimer Lasers, Optics, and Applications
Harry Shields; Peter E. Dyer, Editor(s)

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