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Proceedings Paper

Ti(C,N) film formed by ion-beam-assisted deposition
Author(s): Han-wei Liu; Yunru Chen; Hai-Tao Cai
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Paper Abstract

The Ti(C,N) film has been synthesised by ion beam assisted deposition in our study, in which a TiC target was bombarded by argon ion beam. Sputtreing depositionof Ti, C and bombardment with argon ion beam were done simultaneously under the environment of nitrogen gas. The component depth profiles and structure of the film were analysed by means of AES and X-ray diffraction. Our results shows that the Ti(C,N) film was composed of TiC crystallites with random orientation and composed of TiN crystallites with preferential orientation and with small grain size. It was confirmed that there is a wide intermixed region of Ti, C, N and Fe atinterface between the film and the substrate. The Ti(C,N) film formed by ion beam assisted deposition exhibits superior hardness and improvement over the wear resistance and friction properties.

Paper Details

Date Published: 14 February 1997
PDF: 3 pages
Proc. SPIE 3040, Smart Structures and Materials 1997: Smart Materials Technologies, (14 February 1997); doi: 10.1117/12.267126
Show Author Affiliations
Han-wei Liu, Southwest Jiaotong Univ. (China)
Yunru Chen, Southwest Jiao Tong Univ. (China)
Hai-Tao Cai, Hong Kong Univ. (Hong Kong)


Published in SPIE Proceedings Vol. 3040:
Smart Structures and Materials 1997: Smart Materials Technologies
Wilbur C. Simmons; Ilhan A. Aksay; Dryver R. Huston, Editor(s)

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