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Proceedings Paper

Atomic-layer-deposited TiO2 dielectric coatings
Author(s): A. Rosental; A. Tarre; A. Gerst; P. Adamson; V. Sammelselg; T. Uustare
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Paper Abstract

The possibilities of the in situ real-time Brewster-angle interferometric reflectance probe to follow cycle-dependent film-quality changes during the atomic layer deposition (ALD) are investigated. Experiments are centered around the growth of amorphous TiO2 thin films on fused quartz substrates in a traveling-wave reactor using TiCl4 and H2O as reactants. It is concluded that ALD has prospects for the preparation of microstructurally homogeneous low- optical-loss TiO2 films in case the precise thickness control is needed. The main problem is the microporosity of the films and as a result their moderate refractive index.

Paper Details

Date Published: 4 February 1997
PDF: 6 pages
Proc. SPIE 2967, Optical Inorganic Dielectric Materials and Devices, (4 February 1997); doi: 10.1117/12.266545
Show Author Affiliations
A. Rosental, Institute of Physics (Estonia)
A. Tarre, Institute of Physics (Estonia)
A. Gerst, Institute of Physics (Estonia)
P. Adamson, Institute of Physics (Estonia)
V. Sammelselg, Institute of Physics (Estonia)
T. Uustare, Univ. of Tartu (Estonia)


Published in SPIE Proceedings Vol. 2967:
Optical Inorganic Dielectric Materials and Devices
Andris Krumins; Donats K. Millers; Andris R. Sternberg; Janis Spigulis, Editor(s)

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