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Proceedings Paper

Engineering the Schottky barrier heights in InGaAs metal-semiconductor-metal photodetectors
Author(s): Walter A. Wohlmuth; Mohamed Arafa; Aaditya Mahajan; Patrick J. Fay; Ilesanmi Adesida
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Paper Abstract

An InGaAs metal-semiconductor-metal photodetector (MSMPD) that employs engineered Schottky barrier heights is proposed and demonstrated in this work. By engineering the barrier heights a significant decrease in dark current with no change in the responsivity or the bandwidth can be obtained in these devices in comparison to conventional MSMPDs. For MSMPDs with an electrode width and spacing of 2 micrometer, a photosensitive area of 2500 micrometer squared, and an applied bias of 5 V, dark currents of 1.42 nA, 381 pA, and 188 pA were obtained for the conventional Ti/Au, the conventional Pt/Ti/Pt/Au, and the engineered Pt/Ti/Pt/Au- Ti/Au MSMPDs, respectively. A Pt/Ti/Pt/Au-Ti/Au MSMPD with a 2 micrometer electrode width and spacing and a broad photosensitive area of 15625 micrometer squared exhibited a dark current density of 18.1 fA/micrometer squared which is lowest dark current density ever reported in literature for an InGaAs MSMPD. The responsivity and bandwidth of the conventional and the engineered MSMPDs was measured and was found to be virtually identical.

Paper Details

Date Published: 22 January 1997
PDF: 9 pages
Proc. SPIE 3006, Optoelectronic Integrated Circuits, (22 January 1997); doi: 10.1117/12.264253
Show Author Affiliations
Walter A. Wohlmuth, Univ. of Illinois/Urbana-Champaign (United States)
Mohamed Arafa, Univ. of Illinois/Urbana-Champaign (United States)
Aaditya Mahajan, Univ. of Illinois/Urbana-Champaign (United States)
Patrick J. Fay, Univ. of Illinois/Urbana-Champaign (United States)
Ilesanmi Adesida, Univ. of Illinois/Urbana-Champaign (United States)

Published in SPIE Proceedings Vol. 3006:
Optoelectronic Integrated Circuits
Yoon-Soo Park; Ramu V. Ramaswamy, Editor(s)

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