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Proceedings Paper

Erbium-doped glass-ridge waveguides fabricated with a collimated magnetron sputter deposition process
Author(s): Cheng-Chung Li; Hong Koo Kim; Michele Migliuolo
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Paper Abstract

We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er- doped film in defining the lateral dimension of a waveguide, but involves a lift-off process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 micrometer thick) was deposited at 350 degrees Celsius using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a lift-off process. The collimated sputtering, however, allowed us easy lift-off of Er-doped films, and produced well-defined ridges with smooth surface profiles as confirmed by scanning electron microscope analysis. Guided mode profiles were measured at 1.3 micrometer wavelength and compared with the simulation results.

Paper Details

Date Published: 22 January 1997
PDF: 9 pages
Proc. SPIE 3006, Optoelectronic Integrated Circuits, (22 January 1997); doi: 10.1117/12.264241
Show Author Affiliations
Cheng-Chung Li, Univ. of Pittsburgh (United States)
Hong Koo Kim, Univ. of Pittsburgh (United States)
Michele Migliuolo, Kurt J. Lesker Co. (United States)

Published in SPIE Proceedings Vol. 3006:
Optoelectronic Integrated Circuits
Yoon-Soo Park; Ramu V. Ramaswamy, Editor(s)

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