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Proceedings Paper

Strong Bragg gratings in nonsensitized low-loss planar waveguides as building blocks for WDM network components
Author(s): Joerg Huebner; Jean-Marc Jouanns; Jens Engholm Pedersen; Rasmus Kromann; Thomas Feuchter; Martin Kristensen
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Paper Abstract

The performance of WDM networks is highly dependent on the wavelength selective components within the network. When using Bragg gratings as wavelength selective elements they have to fulfill a number of criteria such as low loss, high reflectivity, nearly square filter function and high background rejection. Highly photosensitive germanium doped silica-on-silicon planar waveguides have been produced by plasma enhanced chemical vapor deposition (PECVD). Total insertion losses (including fiber to waveguide coupling losses) down to 1 dB for a 5.1 cm long waveguide have been measured at 1541 nm. A germanium content of 8.6 mol% in the core combined with the PECVD process insures high photosensitivity towards 193 nm. Twenty mm long Bragg gratings have been induced by illuminating the waveguides with 193 nm light through a phase mask. The induced gratings show up to 99.98 percent reflectivity and a background rejection better than 22 dB at plus or minus 1 nm from the Bragg wavelength. No hydrogen loading or any other kind of sensitization was necessary to produce these gratings. The spectral flatness (3 dB reflection bandwidth: 0.55 nm and 1 dB reflection bandwidth: 0.47 nm) around the Bragg wavelength and the high background rejection make these gratings well suited building blocks for multi-wavelength network components.

Paper Details

Date Published: 23 January 1997
PDF: 11 pages
Proc. SPIE 2998, Photosensitive Optical Materials and Devices, (23 January 1997); doi: 10.1117/12.264171
Show Author Affiliations
Joerg Huebner, Technical Univ. of Denmark (Denmark)
Jean-Marc Jouanns, Technical Univ. of Denmark (Denmark)
Jens Engholm Pedersen, NKT Research Ctr. (Denmark)
Rasmus Kromann, NKT Research Ctr. (Denmark)
Thomas Feuchter, Technical Univ. of Denmark (Denmark)
Martin Kristensen, Technical Univ. of Denmark (Denmark)


Published in SPIE Proceedings Vol. 2998:
Photosensitive Optical Materials and Devices
Mark P. Andrews, Editor(s)

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