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Proceedings Paper

Recent development on silica waveguide technology for integrated optics
Author(s): Soichi Kobayashi
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Paper Abstract

Silica waveguide technologies have been developed based on a combination of the flame hydrolysis deposition and reactive ion etching, which have the advantage of structure controllability and reproducibility of integrated circuits. The bonding technology using UV adhesive and the mold packaging technology have been developed. Silica waveguide integrated devices such as 1 by N, 2 by N and N by N, polarization maintaining splitters, wavelength division multi/demultiplexers, frequency division multi/demultiplexers, dense WDMs, and optical switching devices can be commercially produced with these technologies.

Paper Details

Date Published: 23 January 1997
PDF: 7 pages
Proc. SPIE 2997, Integrated Optics Devices: Potential for Commercialization, (23 January 1997); doi: 10.1117/12.264156
Show Author Affiliations
Soichi Kobayashi, Photonic Integration Research, Inc. (United States)

Published in SPIE Proceedings Vol. 2997:
Integrated Optics Devices: Potential for Commercialization
S. Iraj Najafi; Mario Nicola Armenise, Editor(s)

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