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Proceedings Paper

Analysis of near-field light intensity
Author(s): Keyi Wang; Zhen Jin; Wenhao Huang
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Paper Abstract

In this paper a numerical simulation is used to calculate near-field intensity by `split light beam.' The calculation proves to be valid as we apply it to the plane wave. In the case of one dimension structure such as a compact disk sample, the near-field intensity profiles show a rather complicated structure. In many cases the near-field intensity does not represent the actual surface profile. The near-field intensity is strongly modulated by the surface structure. When the distance between the sample and the probe becomes larger, some subtle perturbation is added to the intensity profile, and a shift between the surface and the intensity profile became more clear. The shift may cause some problems when we use the optical probe as a multi- function probe to do some lithograph work or to position. In this paper, a comparison between the calculation and experiment results was made.

Paper Details

Date Published: 31 December 1996
PDF: 7 pages
Proc. SPIE 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96), (31 December 1996); doi: 10.1117/12.263073
Show Author Affiliations
Keyi Wang, Univ. of Science and Technology of China (China)
Zhen Jin, Univ. of Science and Technology of China (China)
Wenhao Huang, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 2866:
International Conference on Holography and Optical Information Processing (ICHOIP '96)

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