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Proceedings Paper

Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle
Author(s): Yonghoon Kim; Jin-Hong Park; Kyung Hee Lee; Hanku Cho; Hee-Sun Yoon
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Paper Abstract

As field size is increased and design rule goes down to O.l8pm, more tight control of defects on the reticle is required than before. T his requirement is m ore critical on contact patterns than line and space(L/S) patterns in the case of the same size of defect. In this paper, test reticles which have background normal contact patterns and background OPC(optical Proximity Correction) contact patterns, respectively, have been investigated for 256M DRAM level. We included a wide variety of programmed defects in background patterns. The geometry of the background contact patterns on the reticle has been designed for 0.3 1 pm m ore or less when printed on a wafer with a 4X reduction stepper. The programmed defects are used for the sensitivity evalution of a defect inspection system, i.e, detectability. Also printability of these defects on the wafer is performed by using a 4X reduction DUV(248nm) stepper to deterrn me not only the reticle defect specification but also the detectability required for the defect inspection system. Test results are as follows: First, the defect specifications required for 256M DRAM can be determined. Second, OPC contact patterns have better wafer results than normal contact patterns in view of depth of focus(DOF) and defect printability. Third, inspection technique for OPC patterns remains the task to be solved. Keywords : detectability, printability, programmed defect, OPC, DOF, serif, simulation

Paper Details

Date Published: 27 December 1996
PDF: 14 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262840
Show Author Affiliations
Yonghoon Kim, Samsung Electronics Co. Ltd. (South Korea)
Jin-Hong Park, Samsung Electronics Co. Ltd. (South Korea)
Kyung Hee Lee, Samsung Electronics Co. Ltd. (South Korea)
Hanku Cho, Samsung Electronics Co. Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co. Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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