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Proceedings Paper

Correction method for radial effect caused by spin process
Author(s): Jin-Min Kim; Seong-Woon Choi; Byung-Cheol Cha; Hee-Sun Yun; Jung-Min Sohn
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Paper Abstract

Owing to spin process used for mask manufacturing, the CD difference can be inevitably made in the radial direction by the centrifugal force. This difference can degrade CD uniformity of the given mask. So the ability of good maskmaking is closely related to the reduction of this difference as much as possible. In this paper, the CDCM (Critical Dimension Correction Method) is proposed. First, CD tendency of the given mask is mapped out. Then overall CD correction is done by making additional exposure for dose correction on the relatively underdeveloped CD region. The CDCM can also give some possibilities of improving wafer resolution by applying to the underdeveloped CD patterns on the wafer which are not corrected by layout design.

Paper Details

Date Published: 27 December 1996
PDF: 7 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262833
Show Author Affiliations
Jin-Min Kim, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co. Ltd. (South Korea)
Byung-Cheol Cha, Samsung Electronics Co. Ltd. (South Korea)
Hee-Sun Yun, Samsung Electronics Co. Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co. Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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