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Proceedings Paper

SELID: a new 3D simulator for e-beam lithography
Author(s): Anja Rosenbusch; Nikos Glezos; Magdalena Kalus; Ioannis Raptis
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Paper Abstract

In the e-beam world a simulator, comparable to well established optical simulators, has not been available so far. SELID (Simulation of E-Beam Lithography in 3 Dimensions) closes this gap by providing a comprehensive simulation tool covering most aspects of today's advanced e- beam lithography, such as process optimization and parameter determination for the e-beam proximity effect correction. SELID consists of 4 major parts: the simulation of the exposure step, the post-exposure bake and the resist development, and the analysis part. On output it displays many different views into the exposed image, 2D exposure images, as well as 2D resist profiles and resist structures in full 3D rendering. This paper presents first results using SELID. The application to direct write will be demonstrated. A commercially available positive e-beam resist was used for electron beam direct write lithography applications. Process optimization and the accuracy of the simulator will be demonstrated. Moreover, the agreement between experiment and simulation will be investigated.

Paper Details

Date Published: 27 December 1996
PDF: 7 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262829
Show Author Affiliations
Anja Rosenbusch, Sigma-C GmbH (United States)
Nikos Glezos, Institute of Microelectronics NCSR Demokritos (Greece)
Magdalena Kalus, Fraunhofer Institut fuer Festkoerpertechnologie (Germany)
Ioannis Raptis, Institute of Microelectronics NCSR Demokritos (Greece)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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