Share Email Print
cover

Proceedings Paper

Performance data obtained on a new mask metrology tool
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A new mask and wafer metrology tool is under final development at Leica to be launched in 1996. Recent performance data on the LMS IPRO system at Leica's development center shows precision and accuracy performance required for the 0.18 micrometers design rule device generation.

Paper Details

Date Published: 27 December 1996
PDF: 7 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262819
Show Author Affiliations
Klaus-Dieter Roeth, Leica Mikroskopie und Systeme GmbH (Germany)
Carola Blaesing-Bangert, Leica Mikroskopie und Systeme GmbH (Germany)
John M. Whittey, Leica Inc. (United States)


Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

© SPIE. Terms of Use
Back to Top