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Proceedings Paper

Data-processing improvements for photomask pattern generators
Author(s): James L. Speidell; Steven A. Cordes; A. Ferry
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Paper Abstract

The performance of optical pattern generators as well as other lithographic tools was often limited by the performance of the data processing equipment and software used to control these tools. In fact, many performance attributes of modern pattern generators is due to the power and flexibility of the modern computers and software. For example, imperfections in the stage travel due to the mechanical components are often mapped out and corrected for in the control software. When key components are upgraded, these older tools regain useful life, at relatively low cost, for research and development and certain production applications. This paper describes modifications which have been made to a GCA 3600F pattern generator resulting in improved performance in key categories such as reliability and throughput. The modifications have been done to the operating system, data storage subsystem, job creation and monitoring system. Also, a generator has been constructed to simplify production of photomasks consisting primarily of regular arrayed patterns.

Paper Details

Date Published: 27 December 1996
PDF: 7 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262818
Show Author Affiliations
James L. Speidell, IBM Thomas J. Watson Research Ctr. (United States)
Steven A. Cordes, IBM Thomas J. Watson Research Ctr. (United States)
A. Ferry, RTS Inc. (United States)


Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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