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Proceedings Paper

Lithography tricks and tribulations
Author(s): Joseph G. Garofalo; Pat G. Watson; Lee E. Trimble; Raymond A. Cirelli; Albert Colina; Ilya M. Grodnensky; B. Herrero; A. Dunbar; Frederick R. Peiffer; R. Takahashi; Regine G. Tarascon-Auriol; Willie J. Yarbrough; Ludwik J. Zych
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Paper Abstract

When considering optical lithography, there is no true substitute for the resolution enhancements afforded by a reduction in actinic radiation. However, as we move below 365 nm i-line systems, the optics and attendant materials considerations become acute. Additionally, there is an obvious economic impetus to breath new life into existing exposure systems. Various optical enhancement schemes have been developed over the past few years for these and other reasons. While many of these are well suited for the patterns and economics of memories, there are a few that enable sub 0.5 kl ASIC imaging. These include: large NA, optical proximity correction, and the deployment of sub- resolution assist features. We will demonstrate a blend of these that will support 280 nm ASIC pattern delineation with i-line (365 nm) systems and binary (non-phase-shift) masks.

Paper Details

Date Published: 27 December 1996
PDF: 12 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262814
Show Author Affiliations
Joseph G. Garofalo, Lucent Technologies/Bell Labs. (United States)
Pat G. Watson, Lucent Technologies/Bell Labs. (United States)
Lee E. Trimble, Lucent Technologies/Bell Labs. (United States)
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
Albert Colina, Lucent Technologies/Bell Labs. (Netherlands)
Ilya M. Grodnensky, Nikon Precision, Inc. (United States)
B. Herrero, Lucent Technologies/Bell Labs. (Spain)
A. Dunbar, Lucent Technologies/Bell Labs. (Spain)
Frederick R. Peiffer, Lucent Technologies/Bell Labs. (United States)
R. Takahashi, Nikon Precision, Inc. (Japan)
Regine G. Tarascon-Auriol, DuPont Photomasks (France)
Willie J. Yarbrough, Lucent Technologies (United States)
Ludwik J. Zych, Nikon Precision, Inc. (United States)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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